Metalorganic Chemical Vapor Deposition and Its Application to the Growth of the Heterostructure Hot Electron Diode
Emanuel, Mark Andrew
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https://hdl.handle.net/2142/75742
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Title Metalorganic Chemical Vapor Deposition and Its Application to the Growth of the Heterostructure Hot Electron Diode Author(s) Emanuel, Mark Andrew Issue Date 1988-03 Keyword(s) MOCVD OMVPE NDR Negative differential resistance Publisher Coordinated Science Laboratory, University of Illinois at Urbana-Champaign Series/Report Name or Number Coordinated Science Laboratory Report no. UILU-ENG-88-2217 Type of Resource text Language English Permalink http://hdl.handle.net/2142/75742 Sponsor(s)/Grant Number(s) Joint Services Electronics Program / N00014-84-C-0149 National Science Foundation Materials Research Laboratory / DMR 83-16981 National Science Foundation Engineering Research Center for Compound Semiconductor Microelectronics / CDR 85-22666 Department of Defense University Research Instrumentation Program / N00014-84-G-0157
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