University of Illinois Urbana-Champaign

Fabrication and Characterization of 5 Micron Channel Silicon Plasma Device

Kim, Eung Soo

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Description

Title
Fabrication and Characterization of 5 Micron Channel Silicon Plasma Device
Author(s)
Kim, Eung Soo
Contributor(s)
Eden, J. Gary
Issue Date
2010-12
Keyword(s)
  • plasma devices
  • microplasma devices
  • device fabrication
  • device characterization
Abstract
Microplasma devices have demonstrated their suitability for several applications such as high resolution displays, photonics, and chemical reactors. This thesis focuses on the fabrication and characterization of 5 micron width microchannel plasma devices fabricated in Si. The realization of this new platform of devices is implemented through VLSI, and MEMs microfabrication techniques. The stable operation and microplasma confinement were observed from pressures as low as 400 Torr and beyond the atmospheric pressures in several novel gases.
Type of Resource
text
Language
en
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http://hdl.handle.net/2142/46975

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